Veeco: LUMINA+ MOCVD equipment received commercial acceptance by Fucai

On June 9, compound semiconductor process equipment company Veeco announced that its new generation LUMINA+ metal organic chemical vapor deposition equipment has obtained commercial acceptance and production qualification certification from Fucai Holdings to meet the large-scale mass production needs of phosphorus arsenide.

According to Veeco’s official disclosure, Fucai has started the evaluation and verification of the LUMINA+ system at its factory in Taiwan, China, since the end of 2025. The entire certification cycle has progressed rapidly, demonstrating the outstanding advantages of this equipment in terms of process stability and capacity scalability.

At present, the system has officially passed the production qualification certification and will be put into large-scale mass production lines of high-end optoelectronic devices. It is reported that LUMINA+ is equipped with the industry's largest capacity reaction chamber, combined with a high-throughput design, which can significantly improve process efficiency and production cost-effectiveness while meeting customers' stringent performance indicators.

Anil Vijayendran, Vice President of Veeco MOCVD Product Line Management, said that LUMINA+ is regarded as a revolutionary product in the rapidly growing arsenide phosphorus market. The scale and precision of the LUMINA+ system are in line with the compound semiconductor industry’s roadmap needs for large-scale manufacturing of high-performance, low-cost optoelectronic devices, and will help innovation in the fields of consumer electronics, automobiles, optical communications and biosensing in the future. Obtaining Fucai's verification not only establishes Veeco's leading position in the field of advanced optoelectronic devices, but also reflects the company's strategic direction of combining mature TurboDisc technology with breakthrough productivity.

It is reported that TurboDisc is the core technology platform of Veeco Instruments' MOCVD equipment. From the perspective of technical characteristics, the TurboDisc platform is known for its high production capacity, high equipment availability and low maintenance requirements.

Its reaction chamber design can quickly resume production after routine maintenance, significantly reducing downtime. At the same time, this technology usually works in conjunction with Veeco's self-developed Uniform FlowFlange airflow distribution technology to form a highly uniform airflow field on the wafer surface, thereby ensuring excellent thickness uniformity and process repeatability of the epitaxial film, and effectively controlling particle contamination.

In terms of material coverage, the TurboDisc platform demonstrates broad adaptability. TurboDisc not only supports gallium nitride-based material systems, serving applications such as blue-green LEDs, power devices, and Micro LEDs, but is also compatible with arsenide phosphorus-based material systems, which is suitable for the epitaxial growth of optoelectronic devices such as red LEDs, lasers, VCSELs, and solar cells. This ability to cross material platforms makes it a key equipment technology that is both versatile and professional in compound semiconductor manufacturing.

Therefore, TurboDisc technology has run through the evolution of all Veeco's MOCVD product lines, from the early K300 and K465 series to the current LUMINA+ system for the arsenide phosphorus market, all based on this underlying architecture.